发明名称
摘要 <P>PROBLEM TO BE SOLVED: To provide a humidification control technology for appropriately controlling a humidification amount of supply gas. <P>SOLUTION: The humidification amount W is not controlled based only on a supply oxidizing gas temperature T<SB>I2</SB>after passing through a humidifier but controlled in consideration of external conditions such as the flow rate Q of the supply oxidizing gas. Specifically, the control target temperature T<SB>IW</SB>of the supply oxidizing gas after passing through the humidifier is determined to obtain the humidification amount corresponding to a request. In determining such a control target temperature T<SB>IW</SB>, the external conditions such as the flow rate Q of the supply oxidizing gas is taken into consideration, and the flow rate of oxidizing off gas led into the humidifier 120 is regulated using a by-pass valve 160 so that the supply oxidizing gas temperature T<SB>I2</SB>after passing through the humidifier, detected by a temperature sensor 24 coincides with the control target temperature T<SB>IW</SB>. <P>COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP4332185(B2) 申请公布日期 2009.09.16
申请号 JP20070164514 申请日期 2007.06.22
申请人 发明人
分类号 H01M8/04;H01M8/10 主分类号 H01M8/04
代理机构 代理人
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