APPARATUS AND METHOD FOR DRYING SUBSTRATES

摘要

An apparatus and a method for drying a substrate are provided to reduce consumption of IPA(Isopropyl Alcohol) and a drying process time by maintaining a temperature on the substrate constantly. An organic solvent is sprayed to an upper side of a rotating substrate. The heated fluid is sprayed to the lower surface of the substrate for increasing the temperature of the substrate(S610). The spraying of the heated fluid is stopped and the organic solvent is sprayed to the upper part of the substrate. The dry gas for improving vaporization of the organic solvent is sprayed with the organic solvent. The organic solvent is sprayed from the center to the edge of the substrate once. The organic solvent is scanned and sprayed from the center to the edge and from the edge to the center(S620).