发明名称 |
DEVICES AND METHODS FOR PATTERN GENERATION BY INK LITHOGRAPHY |
摘要 |
The present invention provides methods, devices and device components for fabricating patterns on substrate surfaces, particularly patterns comprising structures having microsized and/or nanosized features of selected lengths in one, two or three dimensions and including relief and recess features with variable height, depth or height and depth. Composite patterning devices comprising a plurality of polymer layers each having selected mechanical and thermal properties and physical dimensions provide high resolution patterning on a variety of substrate surfaces and surface morphologies. Gray-scale ink lithography photomasks for gray-scale pattern generation or molds for generating embossed relief features on a substrate surface are provided. The particular shape of the fabricated patterned can be manipulated by varying the three-dimensional recess pattern on an elastomeric patterning device which is brought into conformal contact with a substrate to localize patterning agent to the recess portion of the pattern. |
申请公布号 |
EP2100192(A2) |
申请公布日期 |
2009.09.16 |
申请号 |
EP20070863549 |
申请日期 |
2007.10.26 |
申请人 |
THE BOARD OF TRUSTEES OF THE UNIVERSITY OF ILLINOIS |
发明人 |
ROGERS, JOHN A.;MENARD, ETIENNE |
分类号 |
G03F9/00;G03B27/04;G03F7/00 |
主分类号 |
G03F9/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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