METHOD AND LITHOGRAPHIC APPARATUS FOR MEASURING AND ACQUIRING HEIGHT DATA RELATING TO A SUBSTRATE SURFACE

摘要

A lithographic apparatus and a method thereof are provided to generate a stroke of a relative movement between a substrate and a level sensor by controlling a first actuator and a second actuator. A supporting body(MT) supports a patterning device(MA) capable of giving a pattern on a cross section of a radiation beam(B). A substrate table(WT) maintains a substrate(W). A projection system projects the radiation beam patterned on a target part of the substrate. A level sensor measures a height of a part or a whole part of the substrate. A first actuator moves the substrate table into a first direction which is vertical about a surface of the substrate. A second actuator moves the substrate table into a second direction which is vertical about a surface of the substrate. A controller generates a stroke of relative movement between the substrate and the level sensor by controlling the first actuator and the second actuator.