发明名称 RESISTANCE CHANGE ELEMENT AND METHOD FOR MANUFACTURING THE SAME
摘要 [PROBLEMS] To provide a resistance change element, which can render the amount of current flown per cell smaller than that in the prior art technique, and a method for manufacturing the same. [MEANS FOR SOLVING PROBLEMS] A resistance change memory (ReRAM) for storing data by taking advantage of a change in resistance of a resistance change element (70), wherein the resistance change memory comprises a lower electrode (a ground-side electrode) (67a) of the resistance change element (70) formed of a transition metal such as Ni, and an upper electrode (a positive electrode-side electrode) (69a) formed of a noble metal such as Pt. A transition metal oxide film (68a) is provided between the lower electrode (67a) and the upper electrode (69a). The transition metal oxide film (68a) is, for example, an oxide film of a transition metal of the same type as the transition metal constituting the lower electrode (67a) (NiOx film).
申请公布号 KR20090097163(A) 申请公布日期 2009.09.15
申请号 KR20097012536 申请日期 2007.05.22
申请人 FUJITSU LIMITED 发明人 NOSHIRO HIDEYUKI
分类号 H01L27/10;H01L27/105 主分类号 H01L27/10
代理机构 代理人
主权项
地址