| 摘要 |
<p>The present invention relates to a process for providing a topography to the surface of a dental implant, said surface being made of a ceramic material. According to this process, at least a part of the surface of the dental implant is etched with an etching solution comprising hydrofluoric acid at a temperature of at least 70°C. Thereby, discrete grains or agglomerates of grains are removed from the ceramic material.</p> |
