发明名称 Via-hole processing method
摘要 In a via-hole formation method of forming a via-hole reaching a bonding pad, in a substrate of a wafer in which a plurality of devices are formed on a surface of the substrate and the bonding pad is formed on each of the devices, a pulse laser beam whose energy distribution is shaped into a top-hat shape is emitted to form a via-hole reaching a via-hole.
申请公布号 US7589332(B2) 申请公布日期 2009.09.15
申请号 US20070900844 申请日期 2007.09.13
申请人 DISCO CORPORATION 发明人 NOMARU KEIJI;MORIKAZU HIROSHI
分类号 G21G5/00;B23K26/38 主分类号 G21G5/00
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