发明名称 Schottky barrier diode and manufacturing method thereof
摘要 To reduce a reverse leakage current in a Schottky barrier diode with achieving a lower forward voltage Vf and a smaller capacitance than in the related art, a Schottky barrier diode includes a semiconductor layer of a first conductivity type, a first electrode which is a metal layer forming a Schottky contact with a main surface of the semiconductor layer, a second electrode forming an ohmic contact with an opposite main surface of the semiconductor layer, a buried layer of a second conductivity type formed within the semiconductor layer so as not to be in contact with the first electrode, where the second conductivity type has a different charge carrier from the first conductivity type, and a guard ring of the second conductivity type formed within the semiconductor layer so as to be in contact with the first electrode and also to surround the buried layer without contacting with the buried layer.
申请公布号 US7588958(B2) 申请公布日期 2009.09.15
申请号 US20060406088 申请日期 2006.04.18
申请人 PANASONIC CORPORATION 发明人 TANAKA YUJI;KASHIMA NAOTOSHI
分类号 H01L21/00;H01L21/329;H01L27/08;H01L29/06;H01L29/872 主分类号 H01L21/00
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