发明名称 Method for fabricating lateral semiconductor device
摘要 A lateral junction semiconductor device and method for fabricating the same comprising the steps of taking a semiconductor structure having a stack formed by a plurality of layers of semiconductor material arranged in a series of substantially parallel planes, the semiconductor material within a first layer having an excess of charge carriers of a first polarity at a first concentration, and selectively removing semiconductor material from the first layer to a depth which varies along a first direction substantially parallel with the planes of the layers within the structure, so as to provide a gradation of the concentration of charge carriers of first polarity within an active layer along the first direction. A photon source comprising said lateral junction semiconductor device.
申请公布号 US7589347(B2) 申请公布日期 2009.09.15
申请号 US20050632934 申请日期 2005.08.02
申请人 QINETIQ LIMITED 发明人 NASH GEOFFREY RICHARD;JEFFERSON JOHN HENRY;NASH KEITH JAMES
分类号 H01L31/00;H01L33/02;H01L33/20;H01S5/042 主分类号 H01L31/00
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