发明名称 NONVOLATILE MEMORY DEVICE AND ITS MANUFACTURING METHOD
摘要 <p>A nonvolatile memory device is characterized in that it comprises a substrate, a first electrode provided on the substrate, a second electrode provided above the first electrode so as to cross the first electrode, and a memory section provided between the first electrode and the second electrode and in that at least either of the area of a first memory section surface of the memory section opposite to the first electrode and the area of a second memory section surface of the memory section opposite to the second electrode is smaller than the area of crossing surfaces of the first and second electrodes which are opposed by crossing each other.</p>
申请公布号 WO2009110120(A1) 申请公布日期 2009.09.11
申请号 WO2008JP65588 申请日期 2008.08.29
申请人 KABUSHIKI KAISHA TOSHIBA;FUKUMIZU, HIROYUKI;HAYAMIZU, NAOYA;TANGE, MAKIKO 发明人 FUKUMIZU, HIROYUKI;HAYAMIZU, NAOYA;TANGE, MAKIKO
分类号 H01L27/10;H01L45/00;H01L49/00 主分类号 H01L27/10
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