发明名称 PROCESS FOR PRODUCING MAGNETORESISTIVE ELEMENT AND APPARATUS FOR PRODUCING MAGNETORESISTIVE ELEMENT
摘要 <p>Disclosed is a process for producing a magnetoresistive element comprising a tunnel barrier forming step. The tunnel barrier forming step comprises a metal layer forming step of forming a metal layer to a first thickness, a plasma treatment step of performing plasma treatment, in which the metal layer is exposed to a plasma of an inert gas to etch the metal layer to a second thickness which is smaller than the first thickness, and an oxidizing step of oxidizing the metal layer subjected to the plasma treatment to form a metal oxide that constitutes a tunnel barrier.</p>
申请公布号 WO2009110608(A1) 申请公布日期 2009.09.11
申请号 WO2009JP54327 申请日期 2009.03.06
申请人 CANON ANELVA CORPORATION;CHOI, YOUNG-SUK 发明人 CHOI, YOUNG-SUK
分类号 H01L43/12;G11B5/39;H01F10/32;H01L21/316;H01L21/8246;H01L27/105;H01L43/08 主分类号 H01L43/12
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