A LINER FOR SEMICONDUCTOR CHAMBER

摘要

A liner for a semiconductor chamber is provided. The semiconductor chamber is divided into a reaction portion to provide a closed reaction space where a wafer is processed and provided with an electrostatic chuck on which the wafer is rested at the bottom thereof and an exhaust portion in communication with the reaction portion through a gate and formed with an exhaust port through which fluids are exhausted from the reaction portion. The liner is mounted in the semiconductor chamber, and comprises: a first liner including a cylindrical portion mounted on the inner wall of the reaction portion and having a gate hole at a position corresponding to the gate, and a flange portion mounted on the bottom of the reaction portion and extending inwardly from the lower end of the cylindrical portion to be integrated with the cylindrical portion; a second liner having one end connected to a lower portion of the gate hole and the other end extending toward the exhaust port to be mounted on the lower portion of the inner surface of the gate; and a third liner having one end connected to an upper portion of the gate hole and the other end extending toward the exhaust portion to be mounted on the upper portion of the inner surface of the gate and be coupled to the upper surface of the second liner. The liner is easy to clean and takes a short time to maintain and repair due to its ease of assembly and disassembly, contributing to the maximization of wafer throughput.