| 摘要 |
<p>Disclosed is a method for processing work (10) having a photoresist layer (12) by using an exposure apparatus (30). Specifically, a transparent sheet (20), which is capable of transmitting the light emitted by the exposure apparatus (30), is placed between an objective lens (35a) of the exposure apparatus (30) and the photoresist layer (12), and the photoresist layer (12) is exposed through the transparent sheet (20).</p> |
