PLASMA PROCESSING APPARATUS

摘要

A plasma monitoring device (100) is provided with a measuring section (101), and a coaxial cable (102) connected to the measuring section (101). One end of the coaxial cable (102) is inserted into a plasma generating region in a processing chamber (2). A leading end portion of the coaxial cable (102) is permitted to be a probe, and the portion is in a state where the core cable is exposed. The measuring section (101) detects frequency distribution of electromagnetic waves existing in plasma detected by the probe portion of the coaxial cable (102), and displays the detected frequency distribution.