| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a new compound for photoresist, which is used to perform microfabrication by photolithography, a photoresist solution using the compound for photoresist, and to provide an etching method for etching a surface of interest by using the photoresist solution. <P>SOLUTION: The compound for photoresist is a compound represented by general formula (I), wherein R<SP>1</SP>and R<SP>2</SP>each independently represent a substituent having a Hammett's substituent constant σp in a range of 0.2-0.9; R<SP>3</SP>represents a hydrogen atom or a monovalent substituent; Φ represents a substituted or unsubstituted aryl group or an aromatic heterocyclic group; and two or more of R<SP>1</SP>, R<SP>2</SP>, R<SP>3</SP>and Φ may bond to each other to form a ring. The photoresist solution contains the compound for photoresist. The etching method is for etching a surface to be processed by using the photoresist solution. <P>COPYRIGHT: (C)2009,JPO&INPIT |
