发明名称 HFET AND ITS FABRICATION PROCESS
摘要 PROBLEM TO BE SOLVED: To provide an HFET which achieves a low on resistance, normally off characteristics and suppression of current collapse simultaneously. SOLUTION: An HFET comprises a first semiconductor layer, a second semiconductor layer heterojunctioned onto the first semiconductor layer and capable of forming a first conductivity type two-dimensional carrier gas layer on the heterojunction interface, a third semiconductor layer formed on the second semiconductor layer and into which impurities are introduced, a source electrode 9 formed on the third semiconductor layer, and a drain electrode 10 formed on the third semiconductor layer separately from the source electrode. The HFET further comprises a fourth semiconductor layer formed insularly between the source electrode and the drain electrode on the third semiconductor layer and having a second conductivity type different from the first conductivity type, and a gate electrode 8 connected electrically with the fourth semiconductor layer. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009206123(A) 申请公布日期 2009.09.10
申请号 JP20080043986 申请日期 2008.02.26
申请人 SANKEN ELECTRIC CO LTD 发明人 SATO KEN
分类号 H01L21/338;H01L29/778;H01L29/812 主分类号 H01L21/338
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