| 摘要 |
PROBLEM TO BE SOLVED: To provide a sensor for detecting a chemical substance that efficiently monitors a component adhering from a clean room environment or the inside of a device to a photomask surface, obtains the contamination state of various films forming the photomask surface in real time, instantaneously responds to trouble which is occurring in the environment or in the device, and minimizes the reduction in yield, and to provide a chemical substance detector. SOLUTION: This sensor for detecting the chemical substance is formed with a surface film of the same composition as the constitution film of a light-shielding section or the reflecting section of the photomask on a surface of a surface acoustic wave element or a crystal oscillator. The chemical substance detector uses the sensor. COPYRIGHT: (C)2009,JPO&INPIT
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