COMPOUND FOR PHOTORESIST, PHOTORESIST SOLUTION, AND ETCHING METHOD USING THE PHOTORESIST SOLUTION

摘要

PROBLEM TO BE SOLVED: To provide a new compound for photoresist, which is used to perform microfabrication by photolithography, a photoresist solution using the compound for photoresist, and to provide an etching method for etching a surface of interest by using the photoresist solution.

SOLUTION: The compound for photoresist is an azo compound or a complex compound of the azo compound with a metal ion. The photoresist solution contains the compound for photoresist. The etching method is for etching a surface to be processed by using the photoresist solution.

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