发明名称 Method for Forming Film and Method for Manufacturing Light Emitting Device
摘要 A method for forming a film in which throughput is improved and a desired pattern is obtained smoothly in stacking a plurality of material layers over a substrate and a method for manufacturing a light emitting device are provided. In advance, a material layer is formed selectively by a droplet discharge method to be in contact with a light absorption layer on a first substrate. A second substrate is disposed so that the material layer faces the second substrate. The light absorption layer is irradiated with a laser light so that a film containing a material included in the material layer is formed on the second substrate. When the light absorption layer have a desired pattern, a film reflecting the pattern of the light absorption layer that has undergone the laser light irradiation is formed on the second substrate.
申请公布号 US2009226631(A1) 申请公布日期 2009.09.10
申请号 US20090398788 申请日期 2009.03.05
申请人 SEMICONDUCTOR ENERGY LABORATORY CO., LTD. 发明人 YAMAZAKI SHUNPEI;SEO SATOSHI
分类号 C08J7/04 主分类号 C08J7/04
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