发明名称 |
Method for Forming Film and Method for Manufacturing Light Emitting Device |
摘要 |
A method for forming a film in which throughput is improved and a desired pattern is obtained smoothly in stacking a plurality of material layers over a substrate and a method for manufacturing a light emitting device are provided. In advance, a material layer is formed selectively by a droplet discharge method to be in contact with a light absorption layer on a first substrate. A second substrate is disposed so that the material layer faces the second substrate. The light absorption layer is irradiated with a laser light so that a film containing a material included in the material layer is formed on the second substrate. When the light absorption layer have a desired pattern, a film reflecting the pattern of the light absorption layer that has undergone the laser light irradiation is formed on the second substrate.
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申请公布号 |
US2009226631(A1) |
申请公布日期 |
2009.09.10 |
申请号 |
US20090398788 |
申请日期 |
2009.03.05 |
申请人 |
SEMICONDUCTOR ENERGY LABORATORY CO., LTD. |
发明人 |
YAMAZAKI SHUNPEI;SEO SATOSHI |
分类号 |
C08J7/04 |
主分类号 |
C08J7/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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