| 发明名称 |
COMPOUND FOR PHOTORESIST, PHOTORESIST SOLUTION AND METHOD OF ETCHING BY USING THE SOLUTION |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a new compound for photoresist used for performing a fine processing by utilizing photolithography, a photoresist solution by using the compound for photoresist, and a method for etching a desired surface by using the photoresist solution. <P>SOLUTION: This compound for photoresist is selected from the group consisting of a cyanine pigment and a styryl pigment. The photoresist solution is provided by containing the compound for photoresist. The method for etching a surface to be processed is provided by using the photoresist solution. <P>COPYRIGHT: (C)2009,JPO&INPIT |
| 申请公布号 |
JP2009203186(A) |
申请公布日期 |
2009.09.10 |
| 申请号 |
JP20080047127 |
申请日期 |
2008.02.28 |
| 申请人 |
FUJIFILM CORP |
发明人 |
WATANABE TETSUYA;USAMI YOSHIHISA |
| 分类号 |
C07D209/10;C07D209/14;C07D209/56;C07D263/56;C07D277/64;C09B23/00;G03F7/004;G03F7/36;G03F7/40;H01L21/027 |
主分类号 |
C07D209/10 |
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