| 摘要 |
PROBLEM TO BE SOLVED: To provide a mask blank for imprint molding capable of forming a fine glass pattern with high pattern precision. SOLUTION: The mask blank 10 for imprint molding has a glass substrate 1 and a thin film 2 formed on the substrate, wherein the thin film 2 is composed of a multilayer film of: an upper layer 4 containing as a main component any one of Ta or a Ta compound and Si or an Si compound and formed of a material allowing etching processing by dry etching using a fluorine-based gas; and a lower layer 3 formed of Cr or a Cr compound. COPYRIGHT: (C)2009,JPO&INPIT |
