| 摘要 |
PROBLEM TO BE SOLVED: To provide a film used for an electronic device such as a semiconductor device, having the excellent film characteristics including dielectric constant and mechanical strength. SOLUTION: The film is formed by applying a film-forming composition containing a compound having an alicyclic hydrocarbon structure and irradiating a microwave of a 5.8 GHz frequency. COPYRIGHT: (C)2009,JPO&INPIT
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