发明名称 |
PHOTOMASK BLANK, PHOTOMASK, AND PHOTOMASK MANUFACTURING METHOD |
摘要 |
A photomask blank has a light-shielding film composed of at least two layers on a transparent substrate. The light-shielding film includes a light-shielding layer made of a material mainly containing tantalum nitride and containing less than 62 at % nitrogen. The material is capable of being dry-etched with a chlorine-based gas containing no oxygen. The light-shielding film further includes a front-surface antireflection layer formed on the light-shielding layer and made of a material not capable of being dry-etched with a chlorine-based gas, but capable of being dry-etched with a fluorine-based gas.
|
申请公布号 |
US2009226826(A1) |
申请公布日期 |
2009.09.10 |
申请号 |
US20090394657 |
申请日期 |
2009.02.27 |
申请人 |
HOYA CORPORATION |
发明人 |
NOZAWA OSAMU |
分类号 |
G03F1/50;G03F1/54;H01L21/027 |
主分类号 |
G03F1/50 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|