| 发明名称 |
(METH)ACRYLATE, POLYMER AND RESIST COMPOSITION |
| 摘要 |
A polymer contains a constituent unit having a specific acetal skeleton. This polymer is able to be used as a resist resin in DUV excimer laser lithography, electron beam lithography, EUV lithography, or the like.
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| 申请公布号 |
US2009226851(A1) |
申请公布日期 |
2009.09.10 |
| 申请号 |
US20090393455 |
申请日期 |
2009.02.26 |
| 申请人 |
MITSUBISHI RAYON CO., LTD. |
发明人 |
OOTAKE ATSUSHI;NAKAMURA TADASHI |
| 分类号 |
G03F7/20;C08F20/28;C08G63/00;C08G63/08;G03F7/039 |
主分类号 |
G03F7/20 |
| 代理机构 |
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