Mask structure position determining method for use during semiconductor manufacturing, involves indicating structure on detector, and calculating position of structure from image of structure on detector

摘要

#CMT# #/CMT# The method involves passing a structure to be measured in an optical path with a measuring device by a measuring table displaced in X and Y coordinate directions. The structure is illuminated with a wavelength, which does not cause a chemical change in a layer on a mask (2), where the layer is attached to a mask blank made of quartz. The structure is indicated on a detector (11) by a contrast cumulative method to increase contrast in an area of the layer and the structure, and a position of the structure is calculated from an image of the structure on the detector. #CMT# : #/CMT# An independent claim is also included for a device for determining a position to be estimated, of a structure of a mask during manufacturing of the mask. #CMT#USE : #/CMT# Method for determining a position to be estimated, of a structure of a mask during manufacturing of the mask that is used for semiconductor manufacturing. #CMT#ADVANTAGE : #/CMT# The structure is indicated on the detector by the contrast cumulative method to increase contrast in an area of the layer and the structure, thus determining the position and/or breadth of the structure of a mask in a simple manner during manufacturing of masks, and detecting possible errors during manufacturing of the masks in a previous stage. #CMT#DESCRIPTION OF DRAWINGS : #/CMT# The drawing shows a schematic optical structure of a coordinate measuring machine. 2 : Mask 10 : Camera 11 : Detector 100 : Optical device 102 : Illuminating device.