| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a colored composition for color filter that forms a precise pattern regardless of exposing conditions, and is excellent in solvent resistance to a polar solvent such as N-methyl pyrrolidone or γ-butyrolactone. <P>SOLUTION: The photosensitive colored composition includes at least a pigment, an alkali-soluble resin, a photopolymerization initiator, a reactive monomer, a polymerization inhibitor, and an organic solvent. The composition contains, as the reactive monomer, a bi-functional monomer having polyether and a multi-functional or tri-functional or more acrylic monomer, the content of the bi-functional monomer in the reactive monomer being 10 to 50 mass%, the content of the multi-functional or tri-functional or more acrylic monomer therein being 20 to 90 mass%, and the content of the reactive monomer in the total solid content being ≥20 mass%. <P>COPYRIGHT: (C)2009,JPO&INPIT |
