| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a plasma processing device for eliminating unevenness of a current flow in a slot antenna due to fixing condition and a difference in size, and making it possible to generate a uniform plasma beam. <P>SOLUTION: A dielectric 4 is arranged to close the upper opening of a plate cover 14 forming a part of a metallic processing vessel, the slot antenna 5 is disposed in the upper part of the dielectric 4 to generate the plasma beam, and the outer edge of the slot antenna 5 is brought into direct contact with the inner wall of the plate cover 14 in all of their peripheries by an elastic conductive member 20 or 25. Further, an electric resistance is made substantially equal in between the inner wall of the plate cover 14 and the outer edge of the slot antenna 5, and a microwave current is made substantially equal in the slot antenna 5, as the electric connection is secured in between the inner wall of the plate cover 14 and the outer edge of the slot antenna 5 at the plate cover 14 and the slot antenna 5, when the microwave current is supplied to the slot antenna 5. <P>COPYRIGHT: (C)2009,JPO&INPIT |
