发明名称 COATING MATERIAL COMPOSITION FOR FORMING FILM AND ANTIREFLECTION BASE MATERIAL
摘要 <P>PROBLEM TO BE SOLVED: To provide a coating material composition for forming a film for lowering cost and achieving high antireflection performance, and to provide an antireflection base material covered with the coating material composition. <P>SOLUTION: The coating material composition for forming the film contains hollow silica particles, solid metal oxide particles, and a matrix formation resin. The content of the solid metal oxide particles is higher than that of the hollow silica particles. Preferably, a mean particle size of the solid metal oxide particles is smaller than that of the hollow silica particles. <P>COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009203285(A) 申请公布日期 2009.09.10
申请号 JP20080044844 申请日期 2008.02.26
申请人 PANASONIC ELECTRIC WORKS CO LTD 发明人 FUKUZAKI RYOZO;TSUJIMOTO HIKARI;YOKOGAWA HIROSHI
分类号 C09D201/00;B32B7/02;C09D7/12;G02B1/11 主分类号 C09D201/00
代理机构 代理人
主权项
地址