NONVOLATILE MEMORY ELEMENT, NONVOLATILE MEMORY APPARATUS, NONVOLATILE SEMICONDUCTOR APPARATUS, AND METHOD OF MANUFACTURING NONVOLATILE MEMORY ELEMENT

摘要

A nonvolatile memory element of the present invention comprises a first electrode (103), a second electrode (105), and a resistance variable layer (104) disposed between the first electrode (103) and the second electrode (104), a resistance value of the resistance variable layer varying reversibly according to an electric signal applied between the electrodes (103),(105), and the resistance variable layer (104) comprises at least a tantalum oxide, and is configured to satisfy 0<x<2.5 when the tantalum oxide is represented by TaOx.