发明名称 POSITIVE PHOTOSENSITIVE POLYIMIDE COMPOSITION
摘要 A positive photosensitive polyimide composition, and an organic insulating layer of dual layer for an organic light emitting device using the composition are provided to control a taper angle and outgassing and to improve adhesion, water repellency and storage stability. A positive photosensitive polyimide composition comprises a polyimide comprising a repeating unit represented by the formula 1; a polyamic acid comprising a repeating unit represented by the formula 2; and a photoactive compound, wherein m is an integer of 1-30; n is an integer of 1-10; X is a tetravalent aromatic organic group; Y1 is a divalent aromatic organic group; Y2 is a divalent silicon-based substituent; and l is an integer of 1-20.
申请公布号 KR20090096365(A) 申请公布日期 2009.09.10
申请号 KR20090019354 申请日期 2009.03.06
申请人 LG CHEM. LTD. 发明人 SEONG, HYE RAN;PARK, CHAN HYO;OH, DONG HYUN;SHIN, HYE IN;KIM, KYUNG JUN;SHIN, SE JIN
分类号 G03F7/039 主分类号 G03F7/039
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