发明名称 |
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN |
摘要 |
A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) including an acid generator (B1) consisting of a compound represented by general formula (b1) shown below (wherein Q1 represents a divalent linkage group containing an oxygen atom; Y1 represents a fluorinated alkylene group of 1 to 4 carbon atoms which may have a substituent, with the proviso that the carbon atom adjacent to the sulfur atom within the -SO3- group has a fluorine atom bonded thereto; X represents a hydrocarbon group of 3 to 30 carbon atoms which may have a substituent; and A+ represents an organic cation), and the resist composition further including an organic compound (C) which generates an acid exhibiting a weaker acid strength than the acid generated from the acid generator (B1) upon exposure. <?in-line-formulae description="In-line Formulae" end="lead"?>[Chemical Formula 1]<?in-line-formulae description="In-line Formulae" end="tail"?> <?in-line-formulae description="In-line Formulae" end="lead"?>X-Q1Y1-SO3+A3 (b1)<?in-line-formulae description="In-line Formulae" end="tail"?>
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申请公布号 |
US2009226842(A1) |
申请公布日期 |
2009.09.10 |
申请号 |
US20090400203 |
申请日期 |
2009.03.09 |
申请人 |
TOKYO OHKA KOGYO CO., LTD. |
发明人 |
SHIMIZU HIROAKI;YOSHII YASUHIRO;UTUMI YOSHIYUKI;HADA HIDEO |
分类号 |
G03F7/20;G03F7/027 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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