发明名称 |
IMPRINT METHOD AND TEMPLATE FOR IMPRINTING |
摘要 |
An imprint method, in which pattern forming is performed by having a light curable material applied on a sample face of a substrate being a processing target hardened by being exposed to light in a state where the light curable material and a pattern formed surface of a template contact each other, the pattern formed surface having a concave-convex pattern formed thereon; wherein in one exposure performed with respect to a predetermined shot of the light curable material, an exposure amount at a light curable material on a first region which contacts a pattern formed region including the concave-convex pattern of the template is greater than an exposure amount at a light curable material on a second region which at least contacts a part of a pattern periphery region of the template, the pattern periphery region existing in a periphery of the pattern formed region of the template.
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申请公布号 |
US2009224436(A1) |
申请公布日期 |
2009.09.10 |
申请号 |
US20090398479 |
申请日期 |
2009.03.05 |
申请人 |
MIKAMI SHINJI;YONEDA IKUO |
发明人 |
MIKAMI SHINJI;YONEDA IKUO |
分类号 |
B29C59/16;B81C99/00;G03F7/00 |
主分类号 |
B29C59/16 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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