发明名称 SUBSTRATE PROCESSING APPARATUS
摘要 A substrate processing apparatus which performs a predetermined process while returning a substrate in a state turning upward substrate to a horizontal direction is provided to perform the process of high precision by preventing vibration of a front end part and a rear end part. A first small stage(41), a second small stage(42) and a third small stage(43) are arranged along a substrate convey direction. The predetermined gas group is infra formed of the substrate. The substrate on the stage is maintained. A substrate convey unit(36) returns a substrate to the one-direction. A processing tool(37) is installed at the upper side of the second small stage. The processing tool performs the predetermined operation about the returned substrate.
申请公布号 KR20090095733(A) 申请公布日期 2009.09.10
申请号 KR20080020850 申请日期 2008.03.06
申请人 TOKYO ELECTRON LIMITED 发明人 YOSHIHARU OTA
分类号 G02F1/13 主分类号 G02F1/13
代理机构 代理人
主权项
地址