发明名称 METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND DEVICE FOR MANUFACTURING SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a method for manufacturing a semiconductor device and a device for manufacturing the semiconductor device by which the breaking, chipping and warping of a wafer are reduced while suppressing the increase of production cost. SOLUTION: A ring-shaped first stage 10 and a second stage 20 which is columnar and larger in height than the first stage are installed in a base section 1 which is thicker at the outer peripheral end part than at the center part while matched with the shape of a reverse surface side of the wafer 30 installed on a dicing stage. When a rib wafer 30 is installed, a projection formed of the first stage 10 and second stage 20 is overlaid with a recess on the reverse surface side of the wafer. The wafer 30 includes its entire surface cut from the top surface side of the wafer 30 without cutting off a rib 32 to be parted into chips. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009206417(A) 申请公布日期 2009.09.10
申请号 JP20080049733 申请日期 2008.02.29
申请人 FUJI ELECTRIC DEVICE TECHNOLOGY CO LTD 发明人 ORIMO YOKO
分类号 H01L21/301;H01L21/683 主分类号 H01L21/301
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