发明名称 Reduced Maintenance Chemical Oxide Removal (COR) Processing System
摘要 A chemical oxide removal (COR) processing system is presented, wherein the COR processing system includes a first treatment chamber and a second treatment chamber. The first treatment chamber comprises a chemical treatment chamber that provides a temperature controlled chamber having a protective barrier. The second treatment chamber comprises a heat treatment chamber that provides a temperature-controlled chamber having a protective barrier.
申请公布号 US2009226633(A1) 申请公布日期 2009.09.10
申请号 US20090470132 申请日期 2009.05.21
申请人 TOKYO ELECTRON LIMITED 发明人 LAFLAMME, JR. ARTHUR H.;HAMELIN THOMAS;WALLACE JAY
分类号 B05D3/14;C25D11/02;H01L21/00;H01L21/306;H01L21/677 主分类号 B05D3/14
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