发明名称 |
Reduced Maintenance Chemical Oxide Removal (COR) Processing System |
摘要 |
A chemical oxide removal (COR) processing system is presented, wherein the COR processing system includes a first treatment chamber and a second treatment chamber. The first treatment chamber comprises a chemical treatment chamber that provides a temperature controlled chamber having a protective barrier. The second treatment chamber comprises a heat treatment chamber that provides a temperature-controlled chamber having a protective barrier.
|
申请公布号 |
US2009226633(A1) |
申请公布日期 |
2009.09.10 |
申请号 |
US20090470132 |
申请日期 |
2009.05.21 |
申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
LAFLAMME, JR. ARTHUR H.;HAMELIN THOMAS;WALLACE JAY |
分类号 |
B05D3/14;C25D11/02;H01L21/00;H01L21/306;H01L21/677 |
主分类号 |
B05D3/14 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|