| 摘要 |
A cover part is provided in a substrate processing apparatus including a processing chamber for accommodating a substrate, a processing gas diffusing and supplying unit, and a processing gas introducing pipe for introducing the processing gas into the processing gas diffusing and supplying unit. The processing gas diffusing and supplying unit includes an internal space formed therein and widening in parallel to a surface of the substrate accommodated in the processing chamber and gas holes allowing the internal space to communicate with the processing chamber. The processing gas introducing pipe is connected to the internal space via an opening, the opening facing a portion of the gas holes. The cover part covering the opening includes a shielding portion which is disposed within the internal space and has a surface facing the opening and a holding portion which holds the shielding portion at a predetermined position.
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