发明名称 GROUP III NITRIDE SEMICONDUCTOR THIN FILM AND GROUP III SEMICONDUCTOR LIGHT EMITTING DEVICE
摘要 A group III nitride semiconductor thin film and a group III nitride semiconductor light emitting device using the same. The group III nitride semiconductor thin film includes a substrate with a concave and convex portions formed thereon; a buffer layer formed on the substrate and made of a group III nitride; and an epitaxial growth layer formed on the buffer layer and made of (11-20) plane gallium nitride. The group III nitride light emitting device includes the group III nitride semiconductor thin film. The present invention allows a high quality a-plane group III nitride semiconductor thin film and a group III nitride semiconductor light emitting device using the same.
申请公布号 US2009224270(A1) 申请公布日期 2009.09.10
申请号 US20090423283 申请日期 2009.04.14
申请人 SAMSUNG ELECTRO-MECHANICS CO., LTD.;THE UNIVERSITY OF TOKUSHIMA 发明人 CHOI RAK JUN;YOSHIKI NAOI;SHIRO SAKAI
分类号 H01L29/205;H01L33/06;H01L33/12;H01L33/32;H01L33/40 主分类号 H01L29/205
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