发明名称 |
GROUP III NITRIDE SEMICONDUCTOR THIN FILM AND GROUP III SEMICONDUCTOR LIGHT EMITTING DEVICE |
摘要 |
A group III nitride semiconductor thin film and a group III nitride semiconductor light emitting device using the same. The group III nitride semiconductor thin film includes a substrate with a concave and convex portions formed thereon; a buffer layer formed on the substrate and made of a group III nitride; and an epitaxial growth layer formed on the buffer layer and made of (11-20) plane gallium nitride. The group III nitride light emitting device includes the group III nitride semiconductor thin film. The present invention allows a high quality a-plane group III nitride semiconductor thin film and a group III nitride semiconductor light emitting device using the same.
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申请公布号 |
US2009224270(A1) |
申请公布日期 |
2009.09.10 |
申请号 |
US20090423283 |
申请日期 |
2009.04.14 |
申请人 |
SAMSUNG ELECTRO-MECHANICS CO., LTD.;THE UNIVERSITY OF TOKUSHIMA |
发明人 |
CHOI RAK JUN;YOSHIKI NAOI;SHIRO SAKAI |
分类号 |
H01L29/205;H01L33/06;H01L33/12;H01L33/32;H01L33/40 |
主分类号 |
H01L29/205 |
代理机构 |
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代理人 |
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地址 |
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