| 摘要 |
PROBLEM TO BE SOLVED: To provide a mold for nanoimprinting improved in distribution in the substrate surface of an etching depth and reproducibility, and a method for producing the mold. SOLUTION: In the mold 1 for nanoimprinting which has a pattern p1 for transfer made of a nanoorder uneven structure and transfers the pattern p1 by pushing it to a resin material to be transferred, a metal oxide layer 3 is formed on a substrate 2 for the mold, and the pattern p1 made of a silicon film or a SiO<SB>2</SB>film 4 is formed on the metal oxide layer 3. COPYRIGHT: (C)2009,JPO&INPIT
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