| 摘要 |
PROBLEM TO BE SOLVED: To provide a mold for nanoimprinting which makes the effects of mold releasability irrespective of the number of times of nanoimprinting by improving a deterioration in mold releasability with the number of times of nanoimprinting. SOLUTION: In the mold 1 for nanoimprinting which has a pattern p1 for transfer made of a nano order uneven structure and transfers the pattern p1 by pushing it to a resin material to be transferred, a fluorinated silicon oxide film 3 is formed on a substrate 2 for the mold, and the pattern p1 is formed on the film 3. COPYRIGHT: (C)2009,JPO&INPIT
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