| 摘要 |
PROBLEM TO BE SOLVED: To prevent misty processing liquid from invading between treating chambers. SOLUTION: The substrate treating device includes a first peeling treating chamber 1 that performs peeling treatment with the peeling liquid, a second peeling treating chamber 3 that performs peeling treatment with the peeling liquid of lower concentration than that of the above peeling liquid, a middle chamber 2 interposed between the treating chambers 1, 3, shutters 25, 34, and the like each open/shut openings 11a, 13a for substrate conveyance formed in partitions 11, 13 of the chamber 1, chamber 2, and chamber 3, air knives 36, 36 that deliver the air towards the opening 13a when the opening 13a is opened at least on the chamber 3 side in the chamber 2, and an exhaust port 40 between the air knives 36, 36 and opening 13a, and is provided with an exhausting means that evacuates the chamber 2 through the port 40. COPYRIGHT: (C)2009,JPO&INPIT
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