| 发明名称 |
PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING ARRAY SUBSTRATE USING THE SAME |
| 摘要 |
A photoresist composition includes; a novolac resin prepared from a phenol compound, wherein the m-cresol constitutes about 70% to about 85% by weight of the weight of the phenol compound, a diazide compound, and an organic solvent. |
| 申请公布号 |
US2009227058(A1) |
申请公布日期 |
2009.09.10 |
| 申请号 |
US20080347202 |
申请日期 |
2008.12.31 |
| 申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
PARK JEONG-MIN;JUNG DOO-HEE;LEE HI-KUK;KIM BYUNG-UK;KIM DONG-MIN |
| 分类号 |
H01L21/027;G03F7/004 |
主分类号 |
H01L21/027 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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