| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure apparatus capable of transferring an image of a pattern laid on a mask onto a photosensitive substrate with high accuracy over the entire area of the pattern. <P>SOLUTION: The exposure apparatus is equipped with: a mask stage MST that has a plurality of holding member pairs 10, each comprising a pair of holding parts 10R, 10L disposed along a first direction and at least one of which is movable in a vertical direction, the plurality of the holding member pairs arranged in a second direction intersecting the first direction, and that holds the mask M via the holding member pairs and moves the mask in the second direction; and a projection optical unit that has a plurality of projection optical modules arranged in the first direction and projects an image of the pattern disposed on the mask moved by the mask stage through a projection optical module. <P>COPYRIGHT: (C)2009,JPO&INPIT |
