发明名称 DETECTING APPARATUS, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To set a value of a parameter in a restoration filter. <P>SOLUTION: A detecting apparatus includes: an imaging device; a focusing optical system for forming an image of an alignment mark formed on a substrate onto the imaging device; and a signal processing unit for processing output signals of the imaging device to detect a position of the alignment mark. The signal processing unit includes a restoration unit for making the restoration filter act on the output signals to generate restoration signals, wherein in the restoration filter the value of the parameter is set. The signal processing unit calculates feature values with regard to a geometry of the alignment mark based on the restoration signals obtained by making the restoration filter act on the output signals for each value of a plurality of the parameters to set the value of the parameter based on a plurality of the feature values thus calculated. <P>COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009206458(A) 申请公布日期 2009.09.10
申请号 JP20080050128 申请日期 2008.02.29
申请人 CANON INC 发明人 OISHI SATORU
分类号 H01L21/027;G03F9/02 主分类号 H01L21/027
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