SURFACE SHAPE MEASURING APPARATUS, EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a shape measuring apparatus, capable of reducing the measurement errors of a surface position detection means caused by an influence of a reflectivity of a pattern formed on a wafer and by thickness irregularities of a resist applied onto the wafer, and to provide a projection exposure device which is equipped with the apparatus.

SOLUTION: This shape measuring apparatus has a constitution such that: a wide-band light from a light source is separated into a measuring light and a reference light; in the polarization state wherein each intensity of an s-polarized light component and a p-polarized light component is equal, the measuring light is allowed to enter the surface of a measuring object and the reference light is allowed to enter a reference mirror respectively at an incident angle which is larger than a Brewster angle (also called as a polarization angle); the measuring light reflected by the measuring object and the reference light reflected by the reference mirror are guided to a photoelectric conversion element; an interference pattern formed by interference between the measuring light and the reference light is detected by the photoelectric conversion element; and thereby, the surface shape of the measuring object is determined.

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