发明名称 PLASMA PROCESSING DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a plasma processing device compatible with various sizes of workpieces. <P>SOLUTION: The plasma processing device M has a plurality of electrode units 10, 10 connected in a longitudinal direction. Each of the electrode units 10 has a first and a second electrode members 11, 12 with lengths corresponding to each other, a first dielectric member 13, and a pair of side frames 16. The first electrode members 11, 11, the first dielectric members 13, 13, and the side frames 16, 16 disposed on the same side in the width direction in the plurality of electrode units 10, 10 are formed in the same specifications and are connected in a longitudinal direction, respectively. <P>COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009205896(A) 申请公布日期 2009.09.10
申请号 JP20080045879 申请日期 2008.02.27
申请人 SEKISUI CHEM CO LTD 发明人 TAKEUCHI HIROTO
分类号 H05H1/24;H01L21/304;H01L21/3065 主分类号 H05H1/24
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