发明名称 THIN FILM TRANSISTOR, METHOD OF MANUFACTURING THE SAME, AND ELECTRONIC DEVICE USING THE SAME
摘要 A thin film transistor according to the present invention includes: a semiconductor layer (5); a source electrode (3s) and a drain electrode (3d) that each are connected to the semiconductor layer (5); an insulating layer (6) that is formed adjacent to the semiconductor layer (5); and a gate electrode (7) that faces the semiconductor layer (5) across the insulating layer (6). The semiconductor layer (5) includes an aggregate of semiconductor fine particles composed of a complex oxide. The complex oxide contains zinc and at least one selected from a group consisting of indium, gallium and rhodium.
申请公布号 US2009224239(A1) 申请公布日期 2009.09.10
申请号 US20070305101 申请日期 2007.06.14
申请人 PANASONIC CORPORATION 发明人 WAKITA NAOHIDE
分类号 H01L29/26;H01L21/336;H01L29/786 主分类号 H01L29/26
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