发明名称 |
LOW POWER AND HIGH DENSITY PLASMA GENERATION APPARATUS, USING RADIO FREQUENCY |
摘要 |
A low power using RF which easily diversifies plasma intensity in low power and a high density plasma generating device are provided to generate seed plasma of a state maintenance by controlling the space of ground electrode. A power pole(6) of a pillar shape is located from workpiece at predetermined interval. A dielectric(5) covers the circumference of the power pole. A secondary plasma earth bar(7) is arranged to close to side of the power pole. A gas inlet is formed between the power pole and supplementary plasma earth bar to provide the reaction gas. A power source controller controls the RF power applied to the power pole. A non-conductor(3) is arranged on the top of surrounding and supplementary plasma earth bar of dielectric. A ground bar(1) is arranged on the top of non-conductor. A metal case surrounds the supplementary plasma earth bar, and the upper side of the side of non-conductor and earth bar and earth bar. |
申请公布号 |
KR20090095368(A) |
申请公布日期 |
2009.09.09 |
申请号 |
KR20080020663 |
申请日期 |
2008.03.05 |
申请人 |
SPS CO., LTD. |
发明人 |
KANG, JUNG GOO;KIM, JEONG HOON;JUNG, TAE HWAN |
分类号 |
H05H1/24;H05H1/46 |
主分类号 |
H05H1/24 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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