发明名称 LOW POWER AND HIGH DENSITY PLASMA GENERATION APPARATUS, USING RADIO FREQUENCY
摘要 A low power using RF which easily diversifies plasma intensity in low power and a high density plasma generating device are provided to generate seed plasma of a state maintenance by controlling the space of ground electrode. A power pole(6) of a pillar shape is located from workpiece at predetermined interval. A dielectric(5) covers the circumference of the power pole. A secondary plasma earth bar(7) is arranged to close to side of the power pole. A gas inlet is formed between the power pole and supplementary plasma earth bar to provide the reaction gas. A power source controller controls the RF power applied to the power pole. A non-conductor(3) is arranged on the top of surrounding and supplementary plasma earth bar of dielectric. A ground bar(1) is arranged on the top of non-conductor. A metal case surrounds the supplementary plasma earth bar, and the upper side of the side of non-conductor and earth bar and earth bar.
申请公布号 KR20090095368(A) 申请公布日期 2009.09.09
申请号 KR20080020663 申请日期 2008.03.05
申请人 SPS CO., LTD. 发明人 KANG, JUNG GOO;KIM, JEONG HOON;JUNG, TAE HWAN
分类号 H05H1/24;H05H1/46 主分类号 H05H1/24
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