发明名称 RESISTANCE CHANGE DEVICE AND PROCESS FOR PRODUCING THE SAME
摘要 <p>[Problems] providing a resistance change element capable of reducing the amount of current per cell, as compared with the conventional one, and a method of manufacturing the same. [Means of solving] In a resistance change element (ReRAM) storing data by utilizing change in resistance of a resistance change element 71, the resistance change element 71 is configured of a lower electrode 67a made of a noble metal such as Pt, a transition metal film 68a made of a transition metal such as Ni, a transition metal oxide film 69a made of a transition metal oxide such as NiOx, and a lower electrode 70a made of a noble metal such as Pt.</p>
申请公布号 EP2099071(A1) 申请公布日期 2009.09.09
申请号 EP20060842901 申请日期 2006.12.19
申请人 FUJITSU LIMITED 发明人 NOSHIRO, HIDEYUKI
分类号 H01L45/00;G11C13/00;H01L27/10 主分类号 H01L45/00
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