发明名称 |
Silica glass and optical material |
摘要 |
It is to obtain a silica glass suitable as a material for an optical material constituting an optical system to be used for EUVL, which has a low coefficient of thermal expansion from 0 to 100° C., and on which formation of concave defects is suppressed in a polishing step to achieve a high level of flatness. A silica glass containing from 0.1 to 10 mass % of Sn calculated as SnO2 and from 3 to 10 mass % of Ti calculated as TiO2, which has a homogeneity of the coefficient of thermal expansion from 0 to 100° C. to the temperature of from 50 to 200 ppb/° C., a coefficient of thermal expansion from 0 to 100° C. of 0±250 ppb/° C., and a Vickers hardness of at most 650.
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申请公布号 |
US7585800(B2) |
申请公布日期 |
2009.09.08 |
申请号 |
US20070962936 |
申请日期 |
2007.12.21 |
申请人 |
ASAHI GLASS COMPANY, LIMITED |
发明人 |
KAWATA MITSUHIRO;TAKADA AKIRA;HAYASHI HIDEAKI;SUGIMOTO NAOKI;KIKUGAWA SHINYA |
分类号 |
C03C3/06;C03B20/00;H05B33/10 |
主分类号 |
C03C3/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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