发明名称 Semiconductor device having an electrode containing boron and manufacturing method thereof
摘要 A semiconductor device includes a semiconductor substrate; an insulation film provided on the semiconductor substrate; and an electrode provided on the insulation film, and containing boron and a semiconductor material, wherein at least one element of the group V and carbon is introduced into an interface between the insulation film and the electrode.
申请公布号 US7586163(B2) 申请公布日期 2009.09.08
申请号 US20050287192 申请日期 2005.11.28
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 KATO KOICHI;MATSUSHITA DAISUKE;MURAOKA KOICHI;NAKASAKI YASUSHI;MITANI YUICHIRO;AOKI NOBUTOSHI
分类号 H01L29/76 主分类号 H01L29/76
代理机构 代理人
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